Development of Large Diameter Silicon Carbide Substrate and Epitaxial Processes

This is a sources-sought synopsis in the area of:
Gallium Nitride (GaN) High Electron Mobility Transistors (HEMTs) are rapidly becoming the technology of choice for high power RF applications.

GaN RF devices are dependent upon the use of high quality, semi-insulating SiC substrates.

The

credit: 3ders


combination of high voltage and current handling as well as switching frequency capabilities make SiC based power devices a viable alternative to silicon technology.

Fabrication of SiC power devices requires homo-epitaxial growth of precisely doped SiC layers ranging in thickness from a few microns to > 100 μm depending upon the voltage requirements.

Critical to the realization is the availability of affordable, high quality, large diameter SiC substrates and epitaxy from a pure play supplier.

The Air Force Research Laboratory (AFRL) is interested in advancing the current technological state-of-the-art with respect to SiC growth and fabrication.
Related Programs

Air Force Defense Research Sciences Program

Department Of Defense


Agency: Department of Defense

Office: Air Force -- Research Lab

Estimated Funding: $13,500,000


Who's Eligible


Relevant Nonprofit Program Categories



Obtain Full Opportunity Text:
Not Available

Additional Information of Eligibility:
Not Available

Full Opportunity Web Address:


Contact:
Jo Ann SillamanGrants Officer/Contracting OfficerPhone 937-713-9965

Agency Email Description:
For Questions & Assistance

Agency Email:
jo.sillaman@us.af.mil

Date Posted:
2016-03-18

Application Due Date:
2016-04-18

Archive Date:
2016-05-18



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